Canada - Chemical vapor deposition system

Description

Purpose of the call for tenders
The Université de Sherbrooke wishes to acquire a chemical vapor deposition (CVD) system for the deposition of epitaxial quality single crystal thin films. This system will be installed in a clean environment equivalent to a class 10,000 in the materials characterization and synthesis laboratory of the Interdisciplinary Institute for Technological Innovation (3IT). This deposition system will be used centrally in research and development on group IV semiconductor materials, related to two-dimensional materials on group IV semiconductor materials.
Contract duration and schedule
Timeline available in the tender documents.
Bid security
No bid security is required.
Performance Security
See tender document.
RFx Document Availability
Tender documents are available only through the electronic tendering system SEAO.
Bid Submission
Only bids received on or before the time and date set for the receipt of bids, as described in the tender documents, will be considered.
It is the bidder's responsibility to ensure that the documents are forwarded in accordance with the terms and conditions.
Bid Opening
Anyone wishing to attend the opening of bids must refer to the tender documents for details and updates.
Reserve
The public body reserves the right, when analyzing the bids, to refuse all bids submitted, even the lowest one

Opportunity closing date

23 November 2020

Value of contract

to be confirmed